Eligibility

Applications are encouraged from all North American cities and from all Jewish cultural and religious backgrounds. The Fellowships are open to high school students who will be completing 10th or 11th grade. The applications deadline is March 3, 2008.

Dates

Two groups of Fellows will travel to Hungary this summer. The dates of the trips for 2008 are:
  • Session 1: June 26th - July 11th
  • Session 2: July 24th - August 8th

Costs

The subsidized cost for the Szarvas Fellowships program, including camp fees, lodging, food, t-shirts, educational and administrative costs and transportation in Hungary is only $1,200. In addition, Fellows are also required to pay for round-trip airfare. There will be a group flight leaving from New York's JFK Airport to Budapest. Round-trip fare is estimated to be around $1000, and we will post a more exact price once it becomes available from the airlines. Fellows will also need to make their own arrangements to arrive in NY for the group flight.

Applications

To apply for the Fellowships, you may download the official Application Form here:

PDF         MSWord

All materials should be received no later than the deadline of March 3, 2008 and mailed to:

2008 Szarvas Fellowships
711 Third Avenue, 10th Floor
New York, NY 10017

Staff Positions

Two counselor positions are available this summer for highly qualified candidates. Responsibilities include working closely with exceptional high school students from many different Jewish backgrounds, developing an interactive curriculum covering international Jewish topics, and stimulating and facilitating discussions amongst the participants.

Candidates should have significant experience working with youth in similar or related informal educational settings. Those interested are encouraged to email a CV with cover letter to Rabbi Seth Braunstein, Director of the Szarvas Fellowships at info@szarvas.org. Since we receive many applications for staff positions, only those candidates who are chosen for interview will be contacted further.



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